کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1677415 | 1518334 | 2014 | 8 صفحه PDF | دانلود رایگان |
• Electron beam-induced deposition of tungsten nano-dot markers was demonstrated.
• Markers allowed high quality reconstruction of an agglomerated nanoparticle sample.
• Marker size affects alignment accuracy.
A method allowing fabrication of nano-dot markers for electron tomography was developed using an electron beam-induced deposition in an ordinary dual beam instrument (FIB and SEM) or an SEM. The electron beam deposited nano-dot markers are suitable for automatic alignment of tomographic series. The accuracy of the alignment was evaluated and the method was demonstrated on agglomerated nanoparticle samples using a rod-shaped sample with no missing wedge effect. Simulations were used to assess the effect of marker size on alignment accuracy.
Journal: Ultramicroscopy - Volume 144, September 2014, Pages 50–57