کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1678656 | 1009953 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
X-ray analysis and mapping by wavelength dispersive X-ray spectroscopy in an electron microscope
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: X-ray analysis and mapping by wavelength dispersive X-ray spectroscopy in an electron microscope X-ray analysis and mapping by wavelength dispersive X-ray spectroscopy in an electron microscope](/preview/png/1678656.png)
چکیده انگلیسی
A compact and easy-to-use wavelength dispersive X-ray spectrometer using a multi-capillary X-ray lens attached to a scanning (transmission) electron microscope has been tested for thin-film analysis. B–K spectra from thin-film boron compounds (B4C, h-BN, and B2O3) samples showed prominent peak shifts and detailed structural differences. Mapping images of a thin W/Si double-layer sample resolved each element clearly. Additionally, a thin SiO2 film grown on a Si substrate was imaged with O–K X-rays. Energy and spatial resolution of the system is also discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 108, Issue 11, October 2008, Pages 1427–1431
Journal: Ultramicroscopy - Volume 108, Issue 11, October 2008, Pages 1427–1431
نویسندگان
Miyoko Tanaka, Masaki Takeguchi, Kazuo Furuya,