کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1678944 | 1518370 | 2007 | 11 صفحه PDF | دانلود رایگان |

A miniature electrostatic element has been designed to selectively apply a 90° phase shift to the unscattered beam in the back focal plane of the objective lens, in order to realize Zernike-type, in-focus phase contrast in an electron microscope. The design involves a cylindrically shaped, biased-voltage electrode, which is surrounded by a concentric grounded electrode. Electrostatic calculations have been used to determine that the fringing fields in the region of the scattered electron beams will cause a negligible phase shift as long as the ratio of electrode length to the transverse feature size is greater than 5:1. Unlike the planar, three-electrode einzel lens originally proposed by Boersch for the same purpose, this new design does not require insulating layers to separate the biased and grounded electrodes, and it can thus be produced by a very simple microfabrication process. Scanning electron microscope images confirm that mechanically robust devices with feature sizes of ∼1 μm can be easily fabricated. Preliminary experimental images demonstrate that these devices do apply a 90° phase shift between the scattered and unscattered electrons, as expected.
Journal: Ultramicroscopy - Volume 107, Issues 4–5, April–May 2007, Pages 329–339