کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1679151 | 1518373 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Transmission properties of hydrogen and helium ion implantation induced waveguide grating structures and potential application
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Optical waveguides in fused silica have been manufactured by H+ implantation, which shows significantly improved transmission properties after implantation. The relationship between the transmission property and the thickness of the cladding layer after surface etching has also been investigated. Grating structures in waveguides have been made by additional He+ implantation with a periodic metal mask covering the surface. The transmission of such grating structures is leveled throughout the measured wavelength range. This observation suggests a new method to make variable optical attenuators (VOAs) to equalize optical powers of different channels.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Ultramicroscopy - Volume 106, Issues 8â9, JuneâJuly 2006, Pages 771-774
Journal: Ultramicroscopy - Volume 106, Issues 8â9, JuneâJuly 2006, Pages 771-774
نویسندگان
Qin Hu, Martin Zinke-Allmang, Yingzhi Sun,