کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1681842 | 1518731 | 2012 | 5 صفحه PDF | دانلود رایگان |
Sputtering of polymer-like amorphous hydrogenated carbon (a-C:H) thin films by 0.5–1 keV N2+ molecular ions has been studied in situ and real-time using a highly sensitive quartz crystal microbalance technique. During bombardment of a fresh, plasma-deposited a-C:H layer with nitrogen ions the measured sputtering yield decreases exponentially with ion fluence until a steady state value is reached at a fluence of typically about 3.5 × 1015 N2+ ions per cm2. A chemical sputtering mechanism has to be considered in addition to physical sputtering to explain the observed steady state sputtering values. Simulations based on the code TRIDYN, which take into account a change of surface composition due to implantation and erosion, are performed to understand the transient development of sputtering yields.
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 286, 1 September 2012, Pages 20–24