کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1683146 1010492 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Sputtered neutral SinCm clusters as a monitor for carbon implantation during C60 bombardment of silicon
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Sputtered neutral SinCm clusters as a monitor for carbon implantation during C60 bombardment of silicon
چکیده انگلیسی
The incorporation of carbon atoms into a silicon surface under bombardment with 40-keV C60+ ions is investigated using time-of-flight mass spectrometry of sputtered neutral and ionized SinCm clusters. The neutral particles emitted from the surface are post-ionized by strong field infrared photoionization using a femtosecond laser system operated at a wavelength of 1400/1700 nm. From the comparison of secondary ion and neutral spectra, it is found that the secondary ion signals do not reflect the true partial sputter yields of the emitted clusters. The measured yield distribution is interpreted in terms of the accumulating carbon surface concentration with increasing C60 fluence. The experimental results are compared with those from recent molecular dynamics simulations of C60 bombardment of silicon.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 11, 1 June 2011, Pages 1300-1305
نویسندگان
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