کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1684889 1010540 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The mutual influence of krypton implantation and pre-existing stress states in polycrystalline alpha titanium
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
The mutual influence of krypton implantation and pre-existing stress states in polycrystalline alpha titanium
چکیده انگلیسی
The stress profile in polycrystalline titanium implanted with krypton ions at different fluences has been determined using synchrotron radiation diffraction. For each fluence, the krypton profile has been measured using Rutherford backscattering geometry. The results were compared to model calculations obtained from the SRIM 2008 computer code. A strong stress relaxation was found for high fluence implantation, whereas for low fluence implantation an additional source of tensile stress was introduced in the near surface region. The projected range of the implanted krypton was significantly reduced compared to the expected range. A possible cause of this discrepancy is the drift of implanted ions under the influence of the pre-existing stress gradient.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 16, 15 August 2009, Pages 2712-2715
نویسندگان
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