MoS2/Ti multilayer deposited on 2Cr13 substrate by PIIID

Plasma immersion ion implantation and deposition (PIIID) was used to fabricate the MoS2/Ti multilayer on the 2Cr13 substrate. The Ti layer was deposited by a pulse cathodic arc plasma source and the MoS2 layer was obtained by a radio-frequency (RF) magnetron sputtering system. Scanning electron microscope (SEM), ball-on-disk, electrochemical and water vapour spray tests were used to characterize the as-deposited multilayer. The SEM result shows that the MoS2/Ti multilayer has formed a good layered structure. The friction curves of MoS2/Ti multilayers reveal that the wear resistance and friction coefficient of the multilayer can be improved significantly by a proper structure. The anode polarization curves obtained in 0.5% H2SO4 solution show that the corrosion current density of the MoS2/Ti multilayer can be decreased to 68% of that of the MoS2 single layer. In addition, results of the water vapour spray test for 48 h show that the surface of the MoS2/Ti multilayer is smooth and no erosion can be found, where the MoS2 single layer is partially peeled off from the substrate.