High-energy ion irradiation effects on atomic structures and optical properties of copper oxide and electronic sputtering

We have investigated high-energy ion irradiation effects on atomic structures and optical properties of copper oxide (Cu2O) film on MgO substrate. X-ray diffraction shows that the diffraction intensity decreases to half of as-deposited film for 100 MeV Xe ion irradiation at 3 × 1012 cm−2 and no amorphization has been observed, while the optical absorption shows little change and no shift of the bandgap has been observed under high-energy ion irradiation. The electronic sputtering yields are also presented.