کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1686063 1518757 2008 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Growth mechanisms of interstitial loops in α-doped UO2 samples
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Growth mechanisms of interstitial loops in α-doped UO2 samples
چکیده انگلیسی

New experimental size distributions are presented for interstitial-type dislocation loops in (U, Pu)O2 samples after 4 and 7 years of self-irradiation along with a new model. For this model, the work of Hayns has been extended to doped materials and to take into account additional phenomena, namely re-solution and coalescence as applied to gas bubble precipitation. The calculations are compared to the experimental size distributions obtained by means of Transmission Electron Microscopy for two different storage times. The role of re-solution and coalescence is discussed based on this model. This constitutes a basis for modelling the high burn-up structure (HBS) formation which is a consequence of the accumulation of radiation damage in nuclear fuels.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 266, Issues 12–13, June 2008, Pages 3008–3012
نویسندگان
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