کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1686206 1010590 2011 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Adsorption and thermal stability of alkanethiol films on GaAs(110): A comparative study by TOF-DRS and TOF-SIMS
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Adsorption and thermal stability of alkanethiol films on GaAs(110): A comparative study by TOF-DRS and TOF-SIMS
چکیده انگلیسی

We present an ion beam study of the adsorption and the thermal stability of short alkanethiol molecules adsorbed on GaAs(110). Direct recoiling spectroscopy shows that the adsorption of ethanethiol and hexanethiol proceeds directly towards a dense standing up phase without passing through a stable phase of lying down molecules as is the case for Au(111). Measurements along specific azimuths suggest that both Ga and As rows are covered by the organic molecules. Short adsorption times from the vapor phase result in films having two desorption peaks near 300 and 500 K. On the other hand, leaving the sample in a thiol atmosphere for several hours produces more stable films, similar to those produced by immersion in the corresponding thiol-ethanol solution. TOF-SIMS results confirm the C–S scission mechanism during the thermal desorption.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 269, Issue 9, 1 May 2011, Pages 924–931
نویسندگان
, , , , , , , , , ,