کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1686768 | 1010622 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Micromachining of amplitude and phase modulated reflective computer generated hologram patterns in silicon
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
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چکیده انگلیسی
Silicon has been machined on lateral resolutions of micrometers and on depth resolutions of nanometers using a recently-developed process based on ion irradiation and electrochemical anodisation. Here we investigate its use as a recording medium for computer generated hologram patterns. We describe the fabrication of both amplitude and phase binary modulated reflective computer generated hologram patterns on a silicon surface with pixel sizes of 5 μm. We further discuss the use of micromachined silicon to variably modulate both amplitude and phase in a continuous, rather than a binary fashion.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 9, 1 May 2010, Pages 1416–1421
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 268, Issue 9, 1 May 2010, Pages 1416–1421
نویسندگان
Y.S. Ow, M.B.H. Breese, Y.R. Leng, S. Azimi, E.J. Teo, X.W. Sun,