Optimization of the thickness of glass/TiO2/Ag/Ti/TiO2/SiON multilayer film

The TiO2/Ag/Ti/TiO2/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis–NIR region. The multilayer film achieves maximum transmittance of 92.7% at 690 nm, in which the both TiO2 layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary.

► We prepared and investigated TiO2/Ag/Ti/TiO2/SiON multilayer film.
► The film exhibits good optical and electrical properties.
► The thicknesses of each layer of the films were optimized.
► The SiON layer was deposited as a cover due to chemical stability and anti-diffusion.