کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1689410 1011229 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Monitoring plasma etching of biomolecules by imaging ellipsometry
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Monitoring plasma etching of biomolecules by imaging ellipsometry
چکیده انگلیسی

Low-pressure plasma discharges can be applied to remove various biomolecules from surfaces. However, the knowledge on the interaction between plasma and biomolecules and the kinetics of their removal is still rather poor, which is a major limiting factor for the optimization of this type of plasma treatment. This is, among other reasons, because of the restrictions of currently used techniques for the evaluation of the rates of biomolecule removal during plasma treatment. Therefore, an alternative method based on imaging ellipsometry is applied in this study. It is shown that this method allows reliable semi-quantitative comparison of the treatment efficiency of plasma discharges sustained in different gas mixtures.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 84, Issue 1, 25 August 2009, Pages 75–78
نویسندگان
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