کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1689851 | 1011242 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of oxygen pressure on the structural and optical properties of ZnO thin films on Si (111) by PLD
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of oxygen pressure on the structural and optical properties of ZnO thin films on Si (111) by PLD Effect of oxygen pressure on the structural and optical properties of ZnO thin films on Si (111) by PLD](/preview/png/1689851.png)
چکیده انگلیسی
ZnO thin films were grown on Si (111) substrates by pulsed laser deposition (PLD) at various oxygen pressures in order to investigate the structural and optical properties of the films. The optical properties of the films were studied by photoluminescence spectra using a 325 nm He–Cd laser. The structural and morphological properties of the films were investigated by XRD and AFM measurements, respectively. The results suggest that films grown at 20 Pa and 50 Pa have excellent UV emission and high-quality crystallinity. The research of PL spectra indicates that UV emission is due to excitonic combination, the green band is due to the replacing of Zn in the crystal lattice for O and the blue band is due to the O vacancies.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 83, Issue 5, 1 January 2009, Pages 906–909
Journal: Vacuum - Volume 83, Issue 5, 1 January 2009, Pages 906–909
نویسندگان
Wang Zhaoyang, Hu Lizhong,