کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1689973 1011247 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Low temperature deposition of ITO on organic films by using negative ion assisted dual magnetron sputtering system
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Low temperature deposition of ITO on organic films by using negative ion assisted dual magnetron sputtering system
چکیده انگلیسی

In a magnetron sputter type negative metal ion deposition, the influence of positive bias voltage (Vb) on the surface morphology, electrical resistivity, optical transmittance, and microhardness of ITO prepared on organic polycarbonate films has been investigated. In this study, the Vb increased from 0 to 250 V to attract secondary negative In and Sn metal ions, which were produced from ITO target by surface negative ionization with intense Cs ion bombardments. During deposition although reactive oxygen gas was not introduced into the chamber, by adjusting Vb at 100 V, ITO films on polycarbonate substrate with resistivity as low as 6.1×10−4 Ω cm and transmittance over 90% at 550 nm have been obtained without intentional substrate heating.AFM measurement also shows that surface roughness varied significantly with Vb. However, too intense ion bombardment originated by high Vb (>100 V) condition increased surface roughness and as a result deteriorated the electrical and optical property of ITO films.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 81, Issue 3, 24 October 2006, Pages 279–284
نویسندگان
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