Carbon nanopillar array deposition on SiO2SiO2 by ion irradiation through a porous alumina template

A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/SiSiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+Cl2+ ions with fluences of 1015–1016ions/cm2. The combined use of pick’n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications.