کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1690445 1011260 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
XPS analysis of WxCy thin films prepared by sputter deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
XPS analysis of WxCy thin films prepared by sputter deposition
چکیده انگلیسی

WxCy thin films with different compositions were studied in order to correlate their properties with the thin-film composition and chemical bonding of C and W atoms. Three WxCy thin films with C concentrations in the range 40–80 at% were deposited on WC–Co substrates by the plasma beam sputtering technique. The composition of the thin films and chemical states of elements were analysed by X-ray photoelectron spectroscopy (XPS) depth profiling. The C and W concentrations in the films were quantified using XPS intensities from a WC–Co substrate with a known composition. The C1s peaks in the high energy resolution XPS spectra of thin films allowed identification of the WC phase and the amorphous carbon phase as a function of the film composition. The results show that the amorphous carbon a-C phase is present in those films with composition x

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 2, 29 October 2007, Pages 150–153
نویسندگان
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