Optical properties of NiO thin films fabricated by electron beam evaporation

Nickel oxide (NiO) thin films were deposited onto quartz substrates by the electron beam deposition technique, and obtained high crystal quality after annealing at 1173 K. The structural and microstructural properties of the films were studied by X-ray diffraction (XRD) and atomic force microscope (AFM), respectively. We focus on the optical characterization of the films, indicating the enhancement of the crystal quality, which was confirmed by the photoluminescence and Raman spectrum. Furthermore, PL studies exhibited room temperature emission at 377 nm, and also shown high ultraviolet/visible rejection ratio (>100).

► We focus on the optical characterization of NiO, particularly in PL studies.
► PL studies exhibited room temperature emission at 377 nm.
► It also presented high ultraviolet/visible rejection ratio (>100).