کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1690876 | 1011280 | 2010 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Simulation of the organic thin film thickness distribution for multi-source thermal evaporation process
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Simulation of the organic thin film thickness distribution for multi-source thermal evaporation process Simulation of the organic thin film thickness distribution for multi-source thermal evaporation process](/preview/png/1690876.png)
چکیده انگلیسی
A model of multi-source thermal evaporation process was proposed to achieve higher deposition rate and uniformity of organic thin film. In this model, several point type sources were uniformly distributed around a circle and evaporated simultaneously to form a surface-like source. Based on the Monte Carlo method, the evaporation process was simulated, and the effect of the number of point type sources, circle radius and source-substrate distance on the uniformity was analyzed. Based on the method proposed in this paper, the uniformity of the thickness in the organic layer was successfully controlled in 5%.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 85, Issue 3, 24 September 2010, Pages 448-451
Journal: Vacuum - Volume 85, Issue 3, 24 September 2010, Pages 448-451
نویسندگان
Hu Chen, Yang Gang, Chen Wenbin, Luo Kaijun, Liu Feng,