کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691131 1011296 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Reactive sputtering of SiO2–TiO2 thin film from composite Six/TiO2 targets
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Reactive sputtering of SiO2–TiO2 thin film from composite Six/TiO2 targets
چکیده انگلیسی

Coatings of SiO2–TiO2 films are frequently used in a number of optical thin film applications. In this work we present results from depositing films with variable Si/Ti ratios prepared by reactive sputtering. The different Si/Ti ratios were obtained by varying the target composition of composite single targets. Compared to co-sputtering this facilitates process control and composition uniformity of the films. Varying the oxygen supply during sputter deposition can result in films ranging from metallic/substoichiometric to stoichiometric oxides. Transmittance spectra of the different films are presented and the optical constants are determined from these spectra. Furthermore, the deposition process, films structure and composition of the films are discussed. The study shows that by choosing the right composition and working in the proper oxygen flow range, it is possible to tune the refractive index.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 85, Issue 2, 20 August 2010, Pages 317–321
نویسندگان
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