کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1691193 | 1011300 | 2008 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Variations of microstructure, conductivity and transparency of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering with target-substrate distances
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Variations of microstructure, conductivity and transparency of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering with target-substrate distances Variations of microstructure, conductivity and transparency of Al-doped ZnO thin films prepared by radio frequency magnetron sputtering with target-substrate distances](/preview/png/1691193.png)
چکیده انگلیسی
Al-doped ZnO films were deposited at different target-substrate distances by radio frequency magnetron sputtering. The crystallite size of the films is reduced with increasing the target-substrate distance, but the (002) preferential orientation of ZnO is observed for all the films. It is found that the target-substrate distance has a great influence on the carrier concentration in the films. Reduction of the target-substrate distance is favorable to obtain higher carrier concentrations. The lowest resistivity of 1.1 Ã 10â3 Ω cm is obtained for the film at target-substrate distance of 55 mm. The optical transmittance in the visible range remains higher than 90% for all the films, and the absorption edge shifts towards the shorter wavelength side with decreasing the target-substrate distance. The band gap was widened by 0.11 eV due to the Burstein-Moss (BM) shift from 3.33 eV to 3.44 eV with the reduction of the target-substrate distance from 60 mm to 55 mm.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 11, 19 June 2008, Pages 1216-1219
Journal: Vacuum - Volume 82, Issue 11, 19 June 2008, Pages 1216-1219
نویسندگان
Luo Chen, Xiaofang Bi,