کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691716 1011329 2006 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature
چکیده انگلیسی

Indium tin oxide (ITO) thin films have been grown onto glass substrates by sputtering at room temperature with various controlled oxygen and argon ratios used as reactive and sputter gases, respectively. After deposition, the samples have been annealed at 350 °C in the same sputtering chamber in vacuum or in air. The structure, morphology and electro-optical characteristics of the ITO coatings have been analyzed as a function of the oxygen added during deposition and of the annealing atmosphere by X-ray diffraction, atomic force microscopy, four points electrical measurements and spectrophotometry. It has been found that the as-deposited amorphous samples crystallize in the cubic structure by annealing. The optical transmittance and the electrical resistance decrease when the oxygen content in the deposition and the annealing atmosphere is reduced.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 80, Issue 6, 10 March 2006, Pages 615–620
نویسندگان
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