کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1691831 1011343 2007 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سطوح، پوشش‌ها و فیلم‌ها
پیش نمایش صفحه اول مقاله
Substrate temperature dependence of the properties of Ga-doped ZnO films deposited by DC reactive magnetron sputtering
چکیده انگلیسی

Ga-doped zinc oxide (ZnO:Ga) transparent conductive films were deposited on glass substrates by DC reactive magnetron sputtering. The influence of substrate temperature on the structural, electrical, and optical properties of ZnO:Ga films was investigated. The X-ray diffraction (XRD) studies show that higher temperature helps to promote Ga substitution more easily. The film deposited at 350 °C has the optimal crystal quality. The morphology of the films is strongly related to the substrate temperature. The film deposited is dense and flat with a columnar structure in the cross-section morphology. The transmittance of the ZnO:Ga thin films is over 90%. The lowest resistivity of the ZnO:Ga film is 4.48×10−4 Ω cm, for a film which was deposited at the substrate temperature of 300 °C.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 82, Issue 1, 12 September 2007, Pages 9–14
نویسندگان
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