Chemical composition dependence of exposure buildup factors for some polymers

Exposure buildup factors for some polymers such as poly-acrylo-nitrile (PAN), poly-methyl-acrylate (PMA), poly-vinyl-chloride (PVC), synthetic rubber (SR), tetra-fluro-ethylene (Teflon) have been computed using the G.P. fitting method in the energy range of 0.015–15.0 MeV, up to the penetration of 40 mean free paths (mfp). The variation of exposure buildup factors for all the selected polymers with incident photon energy at the fixed penetration depths has been studied, mainly emphasizing on chemical composition (equivalent atomic number) of the selected polymers. It has been observed that for the lower penetration depths (below 10 mfp), the exposure buildup factor decreases with the increase in equivalent atomic number of the selected polymers at all the incident photon energies. However, at the penetration depth of 10 mfp and incident photon energy above 3 MeV, the exposure buildup factor becomes almost independent of the equivalent atomic number of the selected polymers. Further, above the fixed penetration depth of 15 mfp of the selected polymers and above the incident photon energy of 3 MeV, reversal in the trend has been observed, i.e., the exposure buildup factor increases with the increase in equivalent atomic number.