Investigation of laterally single-diffused metal oxide semiconductor (LSMOS) field effect transistor

• The charge plasma (CP) concept is implemented for LDMOS.
• The CP concept is an alternative way of implementing an LDMOS with lower thermal budget.
• The LDMOS implemented with CP has a similar performance as that of a conventionally implemented LDMOS.

We propose a distinct approach to implement a laterally single diffused metal-oxide-semiconductor (LSMOS) FET with only one impurity doped p-n junction. In the LSMOS, a single p-n junction is first created using lateral dopant diffusion. The channel is formed in the p region of the p-n junction and the n region acts as the drift region. Two distinct metals of different work function are used to form the “n+” source/drain regions and “p+” body contact using the charge plasma concept. We demonstrate that the LSMOS is similar in performance to a laterally double diffused metal-oxide-semiconductor (LDMOS) although it has only one impurity doped p-n junction. The LSMOS exhibits a breakdown voltage of ∼50.0 V, an average ON-resistance of 48.7 mΩ-mm2 and a peak transconductance of 53.6 μS/μm similar to that of a comparable LDMOS.