Surface defects characterization with frequency and force modulation atomic force microscopy using molecular dynamics simulations

This paper is devoted to the characterization of the surface defects using a recently developed AFM technique called frequency and force modulation AFM (FFM–AFM). The simulated system includes a recently developed gold coated AFM probe which interacts with a sample including single-atom vacancy and impurities. In order to examine the behavior of the above system on different transition metals, the molecular dynamics (MD) simulation with Sutton–Chen (SC) inter-atomic potential is used. In this study, an online imaging simulation of the probe and sample is performed, and the effects of the horizontal scan speed, the effective frequency set-point, the cantilever stiffness, the tip-sample rest position and the cantilever quality factor on the resulting images are investigated. Using a proposed optimum controlling scheme for the excitation force amplitude, the cantilever horizontal speed can be increased.