کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1789301 1023500 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of two-dimensional magnetic arrays using CMOS process
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Fabrication of two-dimensional magnetic arrays using CMOS process
چکیده انگلیسی

We fabricated two-dimensional (2-D) Co magnetic arrays starting from a 40-nm-thick Co layer on a 6-in. Si wafer by photolithography with a KrF laser source and the wet-etching process. Various patterns, including square and triangular lattices, were achieved, with their smallest feature size ranging from 300 to 800 nm. In this paper, we present the key processes to prepare nano-scaled 2-D magnetic arrays and the fabricated structures, along with their magnetic properties.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Current Applied Physics - Volume 9, Issue 2, Supplement, March 2009, Pages e193–e196
نویسندگان
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