کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1827114 1027404 2010 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Annealing study of a bistable cluster defect
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم ابزار دقیق
پیش نمایش صفحه اول مقاله
Annealing study of a bistable cluster defect
چکیده انگلیسی

This work deals with the influence of neutron and proton induced cluster related defects on the properties of n-type silicon detectors. Defect concentrations were obtained by means of Deep Level Transient Spectroscopy (DLTS) and Thermally Stimulated Current (TSC) technique, while the full depletion voltage and the reverse current were extracted from capacitance–voltage (C–V) and current–voltage (I–V) characteristics.The annealing behaviour of the reverse current can be correlated with the annealing of the cluster related defect levels labeled E4aE4a and E4bE4b by making use of their bistability. This bistability was characterised by isochronal and isothermal annealing studies and it was found that the development with increasing annealing temperature is similar to that of divacancies. This supports the assumption that E4aE4a and E4bE4b are vacancy related defects. In addition we observe an influence of the disordered regions on the shape and height of the DLTS or TSC signals corresponding to point defects like the vacancy-oxygen complex.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment - Volume 612, Issue 3, 11 January 2010, Pages 525–529
نویسندگان
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