کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1884438 | 1043343 | 2010 | 5 صفحه PDF | دانلود رایگان |
![عکس صفحه اول مقاله: Plasma- and vacuum-ultraviolet (VUV) photo-polymerisation of N- and O-rich thin films Plasma- and vacuum-ultraviolet (VUV) photo-polymerisation of N- and O-rich thin films](/preview/png/1884438.png)
Nitrogen (N)- and oxygen (O)-rich organic thin films were deposited by vacuum-ultraviolet (VUV)-assisted photo-chemical polymerisation of flowing ethylene (C2H4)–ammonia (NH3) and C2H4–nitrous oxide (N2O) mixtures of varying ratios, R, respectively. The reaction mechanism of these binary gas mixtures was investigated as a function of the wavelength, λ, of two near-mono-chromatic VUV sources. Surface-near compositions of these “UV-PE:N” and “UV-PE:O” films were determined by X-ray photoelectron (XPS), and by Fourier transform (reflection–absorption) infrared (FTIR) spectroscopies. The two types of films were compared with plasma polymers deposited using low-pressure radio-frequency (r.f.) glow discharges in similar gas flow mixtures, “PPE:N” and “PPE:O”. VUV-photochemistry appears to be superior to plasma-chemistry in its capability to produce nearly “mono-functional” organic thin films, ones that are rich in primary amines, –NH2, and in carboxylic acid groups, –COOH, respectively.
Journal: Radiation Physics and Chemistry - Volume 79, Issue 3, March 2010, Pages 310–314