کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1891773 1043920 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Study on resist sensitivities for nano-scale imaging using water window X-ray microscopy
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم تشعشع
پیش نمایش صفحه اول مقاله
Study on resist sensitivities for nano-scale imaging using water window X-ray microscopy
چکیده انگلیسی

The sensitivities of deep-UV resist TDUR-P722 (Tokyo Ohka Kogyo Co., Ltd.) and two types of electron beam (EB) resists ZEP520A and ZEP7000 (ZEON Co.) to soft X-rays in the water window region (284–532 eV) were investigated for the nano-scale imaging of the contact X-ray microscopy. At the periphery of the water window, there are absorption edges of main constituent elements of the resist materials, namely carbon and oxygen. It was found that the sensitivities varied widely along the range of X-ray energies used, which correlated with the X-ray absorption of the resists. Moreover for the first time, it was confirmed that K- and L-edge absorptions have a strong influence on the resist sensitivity. Among these resists, ZEP7000 had the highest sensitivity. It was suggested that water window X-ray imaging with nano-scale resolution would be possible with about 1/500 of the fluence, which has the same units (mJ/cm2 or J/cm2) as that of so-called dose/sensitivity in the field of resist research, compared with the previously reported method of using polymethylmethacrylate (PMMA). The details of the reaction mechanisms of the resists will be published elsewhere.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Radiation Physics and Chemistry - Volume 80, Issue 2, February 2011, Pages 248–252
نویسندگان
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