A study on properties of yttrium-stabilized zirconia thin films fabricated by different deposition techniques

• YSZ thin films were deposited by sputter, ALD and PLD, respectively.
• ALD YSZ has advantages such as uniform grain size and dense structure.
• ALD YSZ has disadvantage in terms of crystallinity but annealing can supplement this phenomenon.
• PLD YSZ and sputter YSZ have similar structure because both of them are PVD technique.

This paper investigates the micro-structural, chemical and crystalline properties of yttrium-stabilized zirconia (YSZ) thin films by using pulsed laser deposition (PLD), atomic layer deposition (ALD) and sputter. Atomic ratio of Y:Zr of YSZ thin films fabricated by three different deposition methods was adjustable. ALD YSZ with smaller grains has high density compared to PLD YSZ and sputter YSZ. On the other hand, the low crystallinity of ALD YSZ can be supplemented by annealing process. From these experimental results, ALD YSZ thin film has the characteristics that satisfy requirements for using an electrolyte of thin film solid oxide fuel cells.