A novel design of low power and high read stability Ternary SRAM (T-SRAM), memory based on the modified Gate Diffusion Input (m-GDI) method in nanotechnology

The effects of different process variations such as density, number of CNTs and temperature variations are extensively evaluated by Monte-Carlo simulation, with respect to performance metrics such as delay, power dissipation and PDP of writing and reading cycles, also RSNM parameter for SRAM cells. The comparison exhibits that in all cases the proposed T-SRAM cell showing a substantial small standard deviation and considerable lower variability percentage than state-of-the art SRAM cells. So, the proposed T-SRAM cell design has the lowest sensitivity variations, thus it is an attractive choice for nano technology application in the presence of impact process and temperature variations. The simulation is done with Synopsys H-SPICE simulator in 32 nm technology under the condition of variations.