H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes

H2O2 and/or TiO2 photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Hazardous Materials - Volume 323, Part B, 5 February 2017, Pages 710-718

Changsheng Guo, Kai Wang, Song Hou, Li Wan, Jiapei Lv, Yuan Zhang, Xiaodong Qu, Shuyi Chen, Jian Xu,