کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5024989 | 1470583 | 2017 | 16 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural, optical and ellipsometric characteristics of PVD synthesized SnO2 thin films on Pt coated silicon wafers
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Structural, optical and ellipsometric characteristics of PVD synthesized SnO2 thin films on Pt coated silicon wafers Structural, optical and ellipsometric characteristics of PVD synthesized SnO2 thin films on Pt coated silicon wafers](/preview/png/5024989.png)
چکیده انگلیسی
Tin oxide thin films were prepared on Pt coated-Si wafers by physical vapor deposition technique. The development of rutile structure of SnO2 was revealed by XRD measurements after annealing the thin films at 750 °C for two hours. The formation of tetrahedral shape particles at different size distributed randomly on the Pt coated Si wafer was confirmed by SEM images. The refractive index, extinction coefficient, thickness, and roughness of the thin films were evaluated using ellipsometric measurements. The energy bandgap of the SnO2 thin films was calculated from the spectrophotometric measurement and is found to be 3.6 ± 0.02 eV before and 3.8 ± 0.02 eV after annealing, respectively.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optik - International Journal for Light and Electron Optics - Volume 144, September 2017, Pages 467-474
Journal: Optik - International Journal for Light and Electron Optics - Volume 144, September 2017, Pages 467-474
نویسندگان
H. Howari, I.B.I. Tomsah,