Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate

Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 365, 1 March 2016, Pages 296-305

Way Foong Lim, Hock Jin Quah, Qifeng Lu, Yifei Mu, Wan Azli Wan Ismail, Bazura Abdul Rahim, Siti Rahmah Esa, Yeh Yee Kee, Ce Zhou Zhao, Zainuriah Hassan, Kuan Yew Cheong,