Optical and electrical properties of Ti(Cr)O2:N thin films deposited by magnetron co-sputtering

- Co-doped well-crystallized stoichiometric Ti(Cr)O2:N thin films are deposited.
- Magnetron sputtering of ceramic TiO2 target is a new strategy for co-doping.
- Bigger contribution from substitutionally incorporated nitrogen is seen in XPS.
- Significant red shift of the fundamental absorption edge is obtained.