Effects of the ratio of O2/Ar pressure on wettability and optical properties of HfO2 films before and after doping with Al

HfO2 films were doped with Al (HfO2:Al) by simultaneous RF magnetron sputtering of HfO2 and DC magnetron sputtering of Al. This method is characterized by its ability to independently control the Al content. According to XRD and XPS analyses, the HfO2:Al film had a structure similar to that of HfO2 film, and most of the Al atoms were not in the HfO2 crystalline. A small amount of Al3+ dopant could transform the hydrophobicity of HfO2 films into hydrophilicity. Moreover, the hydrophilicity of the HfO2:Al films improved as the ratio of O2/Ar pressure increased. The nonlinear refractive indices of HfO2 and HfO2:Al films deposited in a pure Ar or a mixed Ar-O2 atmosphere were measured by Moiré deflectometry, and were of the order of 10-8 cm2 W-1. A lower surface roughness, higher optical transmission in the UV-vis-NIR region, and higher linear refractive index were obtained at a higher ratio of O2/Ar pressure.