کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5349370 | 1503615 | 2015 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of interfacial Fe electronic structures on magnetic and electronic transport properties in oxide/NiFe/oxide heterostructures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
We report that the magnetic and electronic transport properties in oxide/NiFe(2 nm)/oxide film (oxide = SiO2, MgO or HfO2) are strongly influenced by the electronic structure of NiFe/oxide interface. Magnetic measurements show that there exist magnetic dead layers in the SiO2 sandwiched film and MgO sandwiched film, whereas there is no magnetic dead layer in the HfO2 sandwiched film. Furthermore, in the ultrathin SiO2 sandwiched film no magnetoresistance (MR) is detected, while in the ultrathin MgO sandwiched film and HfO2 sandwiched film the MR ratios reach 0.35% and 0.88%, respectively. The investigation by X-ray photoelectron spectroscopy reveals that the distinct interfacial redox reactions, which are dependent on the oxide layers, lead to the variation of magnetic and transport properties in different oxide/NiFe/oxide heterostructures.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 349, 15 September 2015, Pages 524-528
Journal: Applied Surface Science - Volume 349, 15 September 2015, Pages 524-528
نویسندگان
Qianqian Liu, Xi Chen, Jing-Yan Zhang, Meiyin Yang, Xu-Jing Li, Shao-Long Jiang, Yi-Wei Liu, Yi Cao, Zheng-Long Wu, Chun Feng, Lei Ding, Guang-Hua Yu,