کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
5350918 1503638 2015 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
Structural and electrical properties of CuIn1−xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process
چکیده انگلیسی
The CuIn1−xAlxSe2 (CIAS) thin films have been prepared by radio-frequency magnetron sputtering process. X-ray diffraction patterns indicate that the lattice constants of the CIAS thin films show about a 2% reduction with the Al content from 0 to 12%. The results of Raman scatting spectroscopy show that the A1 mode position exhibits a blueshift with the increasing Al content. The grain size becomes smaller evidently with the increase of Al content. From the current-voltage characteristics of the interface for Al-ZnO/CIAS thin films, the threshold voltage decreases varying from darkness to illumination, the barrier heights are 0.775 eV in the dark and 0.697 eV under light illumination, respectively, and the values of ideality factor vary from 2.19 to 1.96 in the dark and under light illumination from the d(V)/d(ln I) versus I curve. The AZO/CIAS thin film exhibits good spectral response in wavelengths ranging from 450 nm to 750 nm. The results indicate that the CIAS thin film is a potential material for photodetector application.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 326, 30 January 2015, Pages 211-215
نویسندگان
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