Thermal stability of pulsed laser deposited iridium oxide thin films at low oxygen atmosphere

- The thermal stability of IrO2 films was strongly dependent on the oxygen pressure and annealing temperature.
- The PLD-IrO2 films had a higher stability than the previous reported results.
- The thermal stability was almost consistent with thermodynamic calculation.
- IrO2 films were found to be stable up to 923 K under oxygen pressure of 1 Pa.
- The room-temperature resistivity of IrO2 films showed a value of 49-58 μΩ cm at PO2 = 1 Pa.