Effects of rf power on chemical composition and surface roughness of glow discharge polymer films

- The growth mechanism of defects in GDP films was studied upon plasma diagnosis.
- Increasing rf power enhanced the etching effects of smaller-mass species.
- The “void” defect was caused by high energy hydrocarbons bombardment on the surface.
- The surface roughness was only 12.76 nm, and no “void” defect was observed at 30 W.