Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon

Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 387, 30 November 2016, Pages 497-502

K. Kanomata, K. Tokoro, T. Imai, P. Pansila, M. Miura, B. Ahmmad, S. Kubota, K. Hirahara, F. Hirose,