Effect of post annealing on structural, optical and dielectric properties of MgTiO3 thin films deposited by RF magnetron sputtering

► MgTiO3 thin films were grown on quartz and Pt-Si substrates by RF sputtering and MIM capacitors were fabricated at different O2%. ► The sputtering target was prepared by mechanical alloying for the first time. ► The effect of annealing and O2% on structural, microstructural, optical and dielectric properties was studied systematically. ► The increase in the refractive index and bandgap on annealing can be attributed to the improvement in packing density and crystallinity. ► The improvement in the dielectric properties is attributed to the increase in crystallinity and reduction in oxygen vacancies.