Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputtering

► We report on the deposition of perovskite La2Ti2O7 and LaTiO2N films. ► The films were grown by reactive sputtering from an oxynitride target. ► The presence of residual water allowed the deposition of oxide films. ► Abrupt changes in deposition rate and nitrogen contents of films were observed.