Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

► The use of pulse bias was effective in suppressing the formation of particles. ► The adhesion of pulse-biased films was improved compared with that of dc-biased films. ► The friction coefficients of Si-N-DLC films were as low as those of Si-DLC films. ► The tribological properties were improved by the use of pulse bias.