کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5354256 | 1503684 | 2013 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Evolution of the mechanical properties of a femtosecond laser modified layer onto a silicon wafer
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Evolution of the mechanical properties of a femtosecond laser modified layer onto a silicon wafer Evolution of the mechanical properties of a femtosecond laser modified layer onto a silicon wafer](/preview/png/5354256.png)
چکیده انگلیسی
Femtosecond laser marking was performed on a silicon single crystal. The mechanical properties were studied by using nanoindentation and Atomic Force Microscope (AFM) techniques. This work shows that the femtosecond laser irradiation of the material involves mechanical modifications of the surface layer. The more the quantity of photonic energy is deposited, the more important the modifications. AFM technique, coupled with nanoindentation technique, prove that the femtosecond laser modified layer is softer and less brittle compared to the as-received silicon wafer. A discussion concerning the coupling between roughness and measurements with nanoindentation is proposed. Under these assumptions, estimations of the deepness of the modified layer are given.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 279, 15 August 2013, Pages 62-66
Journal: Applied Surface Science - Volume 279, 15 August 2013, Pages 62-66
نویسندگان
S. Valette, S. Benayoun,