Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

► A highly adhered CrN film has been fabricated using a novel PBII&D technique based on high power pulsed magnetron discharge (HPPMS-PIII&D). ► The film exhibits a dense columnar structure and smooth, clean surface without macro-particles. ► The grains in the films have the face-center cubic (fcc) structure with highly (2 0 0) preferred orientation. ► The high-voltage pulse has a critical effect on the structure and properties of the prepared coatings for HPPMS-PIII&D.