Very hard TiN thin films grown by pulsed laser deposition

► TiN films thinner than 400 nm were grown at RT and 300 °C by PLD technique. ► Simulation of XRR curves acquired showed that TiN films were very dense and smooth. ► XRD spectra found that TiN were crystalline, with crystallites size from 10 to 35 nm and micro-strain values of 0.6-1.1%. ► Nanoindentation investigations found hardness values between 35 and 40 GPa.