Resistless patterning of a chlorine monolayer on a Si(0Â 0Â 1) surface with an electron beam

We achieved electron beam (e-beam) patterning without a photoresist on a Cl-terminated Si(0 0 1) surface. The Cl-Si bonds were easily broken by the irradiation with an e-beam of 1 keV. We demonstrated the selective adsorption of desired molecules on the surface by e-beam irradiation in environments consisting of different gases, such as oxygen, ammonia, and 1-butanethiol.